GF has launched SYGEF Ultra, a high-purity PEEK piping system for semiconductor ultrapure water systems, with company testing indicating rinsing times can be reduced by around 80% compared with established high-purity PVDF systems.
The new system has been developed for hot and ambient ultrapure water distribution in advanced semiconductor fabrication plants, where increasingly stringent contamination controls are placing greater demands on piping materials.
Growth in artificial intelligence, high-performance computing and advanced manufacturing is increasing investment in semiconductor production, while more complex chip designs require tighter control of impurities in process water.
Semiconductor ultrapure water systems face tighter purity requirements
Ultrapure water is used extensively throughout semiconductor manufacturing, where very low concentrations of particles, ions and organic contaminants are required to protect manufacturing processes and chip yields.
GF said SYGEF Ultra has been developed to address these requirements using high-purity polyether ether ketone, or PEEK, for the transport of hot and ambient ultrapure water.
The material combines mechanical strength at elevated temperatures with chemical and impact resistance, while its smooth internal surface and low leach-out characteristics are intended to minimise contamination of the water being transported.
The SEMI F57 standard sets minimum performance requirements for high-purity polymer materials and components used to convey ultrapure water in semiconductor distribution systems.
SYGEF Ultra targets faster rinsing and commissioning
According to GF, testing indicates that SYGEF Ultra can reach required water-quality specifications within days, reducing rinsing time by approximately 80% compared with established high-purity PVDF systems.
GF’s SYGEF Ultra product information reports rinse-down from more than 30 days to less than three days for specified SEMI F63 total organic carbon levels in comparative testing.
Shorter rinsing periods could reduce the water, time and operational resources required during commissioning of semiconductor ultrapure water systems.
Thomas Hary, President of the GF Industry and Infrastructure Flow Solutions division, said: “As semiconductor manufacturing advances, customers need partners who understand both the complexity of their processes and the performance required from critical infrastructure. With SYGEF Ultra, we are combining peace-of-mind jointing, long-term reliability with significantly shorter rinsing times, helping customers commission their systems faster and more efficiently,”
PEEK material designed for high-purity water distribution
GF said the system has been designed to deliver low levels of total organic carbon, anionic and cationic leach-out, alongside rapid rinse-down performance.
The company expects the system to have a service life of at least 25 years under its intended operating conditions.
The PEEK-HP resin used to manufacture SYGEF Ultra does not meet the OECD definition of a PFAS substance, according to GF.
However, GF notes that the complete piping system should not be described as PFAS-free because commonly used sealing and gasket materials such as FKM and PTFE are fluorinated materials.
The SYGEF Ultra range includes pipes, fittings and valves for ultrapure water transport in semiconductor fabs. Image: GF
GF expands microelectronics water infrastructure portfolio
SYGEF Ultra forms part of GF’s wider microelectronics offering, which includes pipes, fittings, valves, jointing technologies, engineering services and pre-fabrication.
The company said the system will primarily be supplied through its pre-fabrication offering, supported by pipe-stress analysis, design assistance, quality assurance and installation and maintenance training.
GF says the system is manufactured and packaged under ISO Class 7 cleanroom conditions within a dedicated high-purity production chain.
The launch comes as semiconductor manufacturing becomes a growing market for ultrapure water infrastructure. GF reported that its semiconductor order intake doubled during the first half of 2026 as investment in advanced fabrication increased.
For more developments in industrial water infrastructure and high-purity treatment, visit H2O Global News’ Industrial coverage.
Source: GF
